OPTORUN A800TBS Atomic layer deposition system is an industrial batch ALD specialized in wafer level optics, such as grating gap filling, three-dimensional surface modification, device packaging and deposition of antireflection and antireflection coatings.
OPTORUN A800TBS Atomic layer deposition system is an industrial batch ALD specialized in wafer level optics, such as grating gap filling, three-dimensional surface modification, device packaging and deposition of antireflection and antireflection coatings.
OPTORUN A800TBS has excellent film uniformity and short single cycle time, high yield, low particle count, and superior electrical and optical properties, thus redefining the large-scale production ALD system.
The A800TBS, which has been specially designed and debugged, can meet the low-temperature deposition process required by current market customers.
OPTORUN A800TBS is produced in a clean room and maintenance operations are carried out in the ash area, saving equipment space. This design makes equipment maintenance easier, consumes fewer materials, and has superior coating repeatability and reliability.
Up to 25 8-inch standard wafer loads
70 – 300℃
Large batch process with extremely short deposition cycle time
At a deposition temperature of 200 ℃, the non-uniformity of Al2O3 film is less than 1%（1sigma）
Highly competitive film uniformity and other performance deposition films：Al2O3, SiO2, TiO2
Precursor position: standard aluminum source, titanium source, water source
Other precursor sources such as ozone, ammonia, and silicon are optional
Manual loading
Semi-automatic loading
Fully automatic loading
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